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1

[IEEE 2016 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2016.3.13-2016.3.14)] 2016 China Semiconductor Technology International Conference (CSTIC) - FinFET technology: Overview and status at 14nm node and beyond

Year:

2016

Language:

english

File:

PDF, 661 KB

english, 2016

2

Second breakdown of vertical power MOSFET's

Chenming Hu, Min-Hwa Chi

Journal:

IEEE Transactions on Electron Devices

Year:

1982

Language:

english

File:

PDF, 637 KB

english, 1982

3

Optimum design of power MOSFET's

Chenming Hu, Min-Hwa Chi, Patel, V.M.

Journal:

IEEE Transactions on Electron Devices

Year:

1984

Language:

english

File:

PDF, 844 KB

english, 1984

4

SPIE Proceedings [SPIE 2016 International Workshop on Information Data Storage and Tenth International Symposium on Optical Storage - Changzhou, China (Sunday 10 April 2016)] 2016 International Workshop on Information Data Storage and Tenth International Symposium on Optical Storage - Embedded NVM technology at BEOL for 14nm FinFET and beyond

Gan, Fuxi, Song, Zhitang, Chi, Min-hwa

Year:

2016

Language:

english

File:

PDF, 702 KB

english, 2016

5

SPIE Proceedings [SPIE Advanced Microelectronic Manufacturing - Santa Clara, CA (Sunday 23 February 2003)] Design and Process Integration for Microelectronic Manufacturing - NBTI improvement for pMOS by Cl-contained 1st oxidation in 20A/65A dual-nitrided gate oxide of 0.13-μm CMOS technology

Hao, Ching-Chen, Chi, Min-Hwa, Chen, Chao-Chi, Lin, Hung-Jen, Lin, Yu-Fang, Hsieh, C. H., Lee, Chih-Hsiung, Chang, Kuang-Hui, Wu, H. T., Shen, Chin-Heng, Starikov, Alexander

Year:

2003

Language:

english

File:

PDF, 231 KB

english, 2003

6

[IEEE 2018 14th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) - Qingdao, China (2018.10.31-2018.11.3)] 2018 14th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) - Fast Development of IC Technologies in AI and IoT Era

Chi, Min-hwa, Xiao, Deyuan, Chang, Richard

Year:

2018

Language:

english

File:

PDF, 3.09 MB

english, 2018

7

[IEEE 2016 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2016.3.13-2016.3.14)] 2016 China Semiconductor Technology International Conference (CSTIC) - Elimination of Tungsten-voids in middle-of-line contacts for advanced planar CMOS AND FinFET technology

Peng, Wen Pin, Chi, Min-hwa, Derderian, Garo, Das, Kakoli, Zhang, Yang, Laloe, Jean-Baptiste, Deniz, Derya, Patil, Suraj, Yan, Jianghu, Singh, SherJang, Zhang, Xiaodong, Zhu, Lei

Year:

2016

Language:

english

File:

PDF, 779 KB

english, 2016

8

[IEEE 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2016.5.16-2016.5.19)] 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Elimination of Tungsten-voids in middle-of-line contacts for advanced planar CMOS and FinFET technology

Peng, Wen Pin, Chi, Min-Hwa

Year:

2016

Language:

english

File:

PDF, 502 KB

english, 2016

9

[IEEE 2019 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2019.3.18-2019.3.19)] 2019 China Semiconductor Technology International Conference (CSTIC) - Fast Development of High-performance ICs in AI/IoT Era

Chi, Min-hwa, Chang, Richard

Year:

2019

File:

PDF, 5.29 MB

2019

10

[IEEE 2016 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2016.3.13-2016.3.14)] 2016 China Semiconductor Technology International Conference (CSTIC) - Reduction of "dark gate" defects in replacement-metal-gate process and middle-of-line contacts for advanced planar CMOS and FinFET technology

Peng, Wen Pin, Chi, Min-hwa, Zhang, Yang, Derderian, Garo, Wahl, Jeremy, Hu, Yue, Liu, Yajiang, Wang, Haiting, Lemon, John, Wang, Tao, Mao, Jiwang, You, Shi

Year:

2016

Language:

english

File:

PDF, 772 KB

english, 2016

11

[IEEE 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2016.5.16-2016.5.19)] 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Reduction of “Dark-Gate” defects in replacement-metal-gate process and middle-of-line contacts for advanced planar CMOS and FinFET technology

Peng, Wen Pin, Chi, Min-Hwa

Year:

2016

Language:

english

File:

PDF, 515 KB

english, 2016

12

[IEEE ICSE '96. 1996 IEEE International Conference on Semiconductor Electronics. Proceedings - Penang, Malaysia (26-28 Nov. 1996)] ICSE '96. 1996 IEEE International Conference on Semiconductor Electronics. Proceedings - Low-voltage multi-level flash memory: determination of minimum spacing between multi-levels [CMOS]

Min-Hwa Chi,, Bergemont, A.

Year:

1996

Language:

english

File:

PDF, 462 KB

english, 1996

13

[IEEE International Symposium on VLSI Technology Systems and Applications - Taipei, Taiwan (8-10 June 1999)] 1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453) - A new self-convergent programming and erase tightening by substrate-hot-electron injection for ETOX cells in triple-well

Min-Hwa Chi,, Chih-Ming Chen,, Chih-Wei Hung,, Yu-Hsiung Wang,

Year:

1999

Language:

english

File:

PDF, 337 KB

english, 1999

14

[IEEE Technical Papers. International Symposium on VLSI Technology, Systems, and Applications - Taipei, Taiwan (June 3-5, 1997)] Proceedings of Technical Papers. International Symposium on VLSI Technology, Systems, and Applications - A High Resolution Cmos Imager With Active Pixel Using Capacitively Coupled Bipolar Operation

Min-hwa Chi,, Delbruck, T., Mascarenhas, N., Bergemont, A., Mead, C.

Year:

1997

Language:

english

File:

PDF, 385 KB

english, 1997

15

[IEEE Fifth International Conference on Solid-State and Integrated Circuit Technology-ICSICT'98 - Beijing, China (21-23 Oct. 1998)] 1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105) - A new DRAM cell structure with Capacitor-Equiplanar-to-Bitline (CEB) for bitline coupling noise elimination

Li-Fu Chang,, Yu-Ming Hsu,, Min-Hwa Chi,

Year:

1998

Language:

english

File:

PDF, 226 KB

english, 1998

16

[IEEE 1995 IEEE International SOI Conference - Tucson, AZ, USA (3-5 Oct. 1995)] 1995 IEEE International SOI Conference Proceedings - Programming and erase with floating-body for high density low voltage flash EEPROM fabricated on SOI wafers

Min-Hwa Chi,, Bergemont, A.

Year:

1995

Language:

english

File:

PDF, 163 KB

english, 1995

17

[IEEE 1998 Sixth International Workshop on Computational Electronics. Extended Abstracts - Osaka, Japan (19-21 Oct. 1998)] 1998 Sixth International Workshop on Computational Electronics. Extended Abstracts (Cat. No.98EX116) - DRAM bit-line coupling noise analysis and simulation of process sensitivity for COB scheme

Li-Fu Chang,, Min-Hwa Chi,

Year:

1998

Language:

english

File:

PDF, 360 KB

english, 1998

18

[IEEE 1982 IEEE Power Electronics Specialists conference - Cambridge, MA, USA (1982.6.14-1982.6.17)] 1982 IEEE Power Electronics Specialists conference - Some issues of power MOSFETs

Chi, Min-hwa, Hu, Chenming

Year:

1982

Language:

english

File:

PDF, 1.29 MB

english, 1982

19

The operation of power MOSFET in reverse mode

Min-hwa Chi, Chenming Hu

Journal:

IEEE Transactions on Electron Devices

Year:

1983

Language:

english

File:

PDF, 457 KB

english, 1983

20

ECS Transactions [ECS China Semiconductor Technology International Conference 2010 (CSTIC 2010) - Shanghai, China (March 18 - March 19, 2010)] - Different Interface Role in CuOx Based RRAM

Wu, J.G, Zhou, Peng, Lin, Y.Y, Huang, R., Song, S., Zou, Q., Wu, H., Chi, Min-hwa

Year:

2010

Language:

english

File:

PDF, 513 KB

english, 2010

21

[IEEE Nonvolatile Memory Technology Conference - Albuquerque, NM, USA (24-26 June 1996)] Proceedings of Nonvolatile Memory Technology Conference - True low-voltage flash memory operations

Min-Hwa Chi,, Bergemont, A.

Year:

1996

Language:

english

File:

PDF, 560 KB

english, 1996

22

[IEEE 2000 IEEE Hong Kong Electron Devices Meeting - Hong Kong, China (24 June 2000)] Proceedings 2000 IEEE Hong Kong Electron Devices Meeting (Cat. No.00TH8503) - New characteristics of direct hole tunneling through ultrathin gate oxide (2.7 nm) in p+/pMOS and its applications

Min-Hwa Chi,, Chih-Hsing Yu,, Ming-Chen Chen,, Min-Chie Jeng,

Year:

2000

Language:

english

File:

PDF, 423 KB

english, 2000

23

[IEEE 1995 International Symposium on VLSI Technology, Systems, and Applications. - Taipei, Taiwan (31 May-2 June 1995)] 1995 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers - A new erase VT distribution model for reliability design in high density flash EEPROM

Min-Hwa Chi,, Haggag, H., Bergemont, A.

Year:

1995

Language:

english

File:

PDF, 436 KB

english, 1995

24

Plasma charging defect characterization, inspection, and monitors in poly-buffered STI

Chih-Hsin Yu,, Min-hwa Chi,, Yuan-Hung Liou,, Yeur-Luen Tu,, Chi-San Wu,, Yu-Shen Chen,, Chib-Yang Pai,, Chia-Shiung Tsai,

Journal:

IEEE Transactions on Semiconductor Manufacturing

Year:

2002

Language:

english

File:

PDF, 1.32 MB

english, 2002

25

[IEEE 2005 IEEE VLSI-TSA. International Symposium on VLSI Technology (VLSI-TSA-TECH) - Hsinchu, Taiwan (25-27 April 2005)] IEEE VLSI-TSA International Symposium on VLSI Technology, 2005. (VLSI-TSA-Tech). - Design and integration of strained SiGe/Si hetero-structure CMOS transistors

Chien-Chao Huang,, Yee-Chia Yee,, Shih-Chang Chen,, Fu-Liang Yang,, Min-Hwa Chi,

Year:

2005

Language:

english

File:

PDF, 349 KB

english, 2005

26

A novel transient characterization technique to investigate trap properties in HfSiON gate dielectric MOSFETs-from single electron emission to PBTI recovery transient

Tahui Wang, Chien-Tai Chan, Chun-Jung Tang, Ching-Wei Tsai, Wang, H.C.-H., Min-Hwa Chi, Tang, D.D.

Journal:

IEEE Transactions on Electron Devices

Year:

2006

Language:

english

File:

PDF, 320 KB

english, 2006

27

[IEEE 2000 Semiconductor Manufacturing Technology Workshop - Hsinchu, Taiwan (14-15 June 2000)] 2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) - Ultrathin (2.7 nm) oxy-nitride for suppressing boron penetration characterized by direct hole tunneling current in p+/pMOS

Chih-hsing Yu,, Ming-chen Chen,, Min-hwa Chi,

Year:

2000

Language:

english

File:

PDF, 487 KB

english, 2000

28

[IEEE Fifth International Conference on Solid-State and Integrated Circuit Technology-ICSICT'98 - Beijing, China (21-23 Oct. 1998)] 1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105) - Technologies for high performance CMOS active pixel imaging system-on-a-chip

Year:

1998

Language:

english

File:

PDF, 316 KB

english, 1998

29

SPIE Proceedings [SPIE Advanced Microelectronic Manufacturing - Santa Clara, CA (Sunday 23 February 2003)] Design and Process Integration for Microelectronic Manufacturing - Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology

Lee, Tzy-Kuang, Wang, Yao-Ching, Chi, Min-hwa, Lu, C. Y., Hsieh, C. H., Liu, R. G., Liao, H. J., Yang, S. S., Chang, Chih-Hao, Starikov, Alexander

Year:

2003

Language:

english

File:

PDF, 638 KB

english, 2003

30

[IEEE 2008 9th International Conference on Solid-State and Integrated-Circuit Technology (ICSICT) - Beijing, China (2008.10.20-2008.10.23)] 2008 9th International Conference on Solid-State and Integrated-Circuit Technology - Technologies and materials for memory with full compatibility to CMOS

Chi, Min-hwa, Wu, HanMing

Year:

2008

Language:

english

File:

PDF, 3.91 MB

english, 2008

31

Errors in threshold-voltage measurements of MOS transistors for dopant-profile determinations

Min-Hwa Chi, Chenming Hu

Journal:

Solid-State Electronics

Year:

1981

Language:

english

File:

PDF, 261 KB

english, 1981

32

[IEEE 1997 55th Annual Device Research Conference Digest - Fort Collins, CO, USA (23-25 June 1997)] 1997 55th Annual Device Research Conference Digest - A new single-poly flash memory cell with low-voltage and low-power operations for embedded applications

Min-Hwa Chi,, Bergemont, A.

Year:

1997

Language:

english

File:

PDF, 200 KB

english, 1997

33

[American Vacuum Soc 2000 5th International Symposium on Plasma Process-Induced Damage - Santa Clara, CA, USA (22-24 May 2000)] 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) - Elimination of notch during gate polycide stack etching by adding nitrogen in over etch step

Bor-Wen Chan,, Liou, Y.H., Min-Hwa Chi,

Year:

2000

Language:

english

File:

PDF, 529 KB

english, 2000

34

[IEEE International Electron Devices Meeting - Washington, DC, USA (10-13 Dec. 1995)] Proceedings of International Electron Devices Meeting - Multi-level flash/EPROM memories: new self-convergent programming methods for low-voltage applications

Min-Hwa Chi,, Bergemont, A.

Year:

1995

Language:

english

File:

PDF, 350 KB

english, 1995

35

ECS Transactions [ECS China Semiconductor Technology International Conference 2010 (CSTIC 2010) - Shanghai, China (March 18 - March 19, 2010)] - CMOS Technology Toward Green

Chi, Min-hwa, Wu, Hanming

Year:

2010

Language:

english

File:

PDF, 744 KB

english, 2010

36

[IEEE 2000 Semiconductor Manufacturing Technology Workshop - Hsinchu, Taiwan (14-15 June 2000)] 2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) - Notch elimination in polycide gate stack etching for advanced DRAM technology

Bor-Wen Chan,, Min-hwa Chi,, Liou, Y.H.

Year:

2000

Language:

english

File:

PDF, 496 KB

english, 2000

37

Low voltage NVGTM: a new high performance 3 V/5 V flash technology for portable computing and telecommunications applications

Bergemont, A., Min-Hwa Chi, Haggag, H.

Journal:

IEEE Transactions on Electron Devices

Year:

1996

Language:

english

File:

PDF, 736 KB

english, 1996

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